CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US7367691B2 | Omnidirectional one-dimensional photonic crystal and light emitting device made from the same | US20040252509A1 | 2004-12-16 00:00:00 | US10/688,625 | 2003-10-17 00:00:00 | US7367691B2 | 2008-05-06 00:00:00 | 2003-06-16 00:00:00 | Chung-Hsiang Lin | HA SHIN Co Ltd;Quantum Nil Ltd;Quantum Nil Ltd Taiwan Branch | | | B82Y20/00;G02B6/1225;H01L33/44;H10K50/125;H10K50/856;H01L25/0753;H01L2924/0002;H01L33/50;H10K50/85;H10K50/852 | 9 | 11 | 65 | Expired - Lifetime | FALSE | TRUE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP2008117922A | 半導体発光素子及びその製造方法 | JP2008117922A | 2008-05-22 00:00:00 | JP2006299348A | 2006-11-02 00:00:00 | | | 2006-11-02 00:00:00 | Yoji Tokumitsu;洋司 徳満;Kazuyuki Tadatomo;一行 只友;Katsuyuki Hoshino;勝之 星野;Tsunemasa Taguchi;常正 田口;Shuichi Kubo;秀一 久保 | Mitsubishi Chemical Corp;Yamaguchi University NUC | | | | 12 | 0 | 27 | Withdrawn | FALSE | TRUE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | CN101278411A | 半导体发光器件中生长的光子晶体 | CN101278411A | 2008-10-01 00:00:00 | CNA2006800217178A | 2006-06-14 00:00:00 | CN101278411B | 2011-08-03 00:00:00 | 2005-06-17 00:00:00 | J·J·小韦勒;M·R·克雷默斯;N·F·加德纳 | Koninklijke Philips NV | 飞利浦拉米尔德斯照明设备美国有限责任公司 | H01L33/00;B6/13;B6/122;B29/60 | C30B29/60;H01L21/20;B82Y20/00;G02B6/1225;H01L33/24;H01L2933/0083;H01L33/08;H01L33/18;H01S5/11;H01S5/34333 | 48 | 65 | 65 | Active | FALSE | TRUE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP5757512B1 | Deep ultraviolet LED and manufacturing method thereof | JP5757512B1 | 2015-07-29 00:00:00 | JP2015508911A | 2014-10-24 00:00:00 | JPWO2015133000A1 | 2017-04-06 00:00:00 | 2014-03-06 00:00:00 | 行雄 鹿嶋;行雄 鹿嶋;恵里子 松浦;恵里子 松浦;小久保 光典;光典 小久保;田代 貴晴;貴晴 田代;貴史 大川;貴史 大川;秀樹 平山;秀樹 平山;隆一郎 上村;隆一郎 上村;大和 長田;大和 長田;聡 嶋谷;聡 嶋谷 | MARUBUN CORP;Tokyo Ohka Kogyo Co Ltd;Ulvac Inc;RIKEN Institute of Physical and Chemical Research;Shibaura Machine Co Ltd | | | H01L33/10;H01L33/50;H01L33/0025;H01L33/0075;H01L33/06;H01L33/32;H01L33/36;H01L33/405 | 13 | 75 | 13 | Active | FALSE | TRUE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US5337328A | Semiconductor laser with broad-area intra-cavity angled grating | US5337328A | 1994-08-09 00:00:00 | US08/097,682 | 1993-07-27 00:00:00 | | | 1992-05-08 00:00:00 | Robert J. Lang;Kenneth M. Dzurko;Donald R. Scifres;David F. Welch | Viavi Solutions Inc | | | H01S5/1032;H01S5/1071;H01S5/20;H01S5/423;H01S5/026;H01S5/028;H01S5/1243;H01S5/125;H01S5/187;H01S5/2036;H01S5/4075;H01S5/42;H01S5/50 | 85 | 5 | 72 | Expired - Lifetime | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US5955749A | Light emitting device utilizing a periodic dielectric structure | US5955749A | 1999-09-21 00:00:00 | US08/758,955 | 1996-12-02 00:00:00 | | | 1996-12-02 00:00:00 | John D. Joannopoulos;Shanhui Fan;Pierre R. Villeneuve;E. Frederick Schubert | Boston University;Massachusetts Institute of Technology | | | H01L33/24;B82Y20/00;G02B6/1225;H01L33/08 | 28 | 7 | 160 | Expired - Lifetime | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP3991612B2 | Light emitting element | JP2002305328A | 2002-10-18 00:00:00 | JP2001109819A | 2001-04-09 00:00:00 | JP3991612B2 | 2007-10-17 00:00:00 | 2001-04-09 00:00:00 | 英夫 朝川;大祐 薦田 | Nichia Corp | | | H01L2224/48091;H01L2224/48247;H01L2224/48257;H01L2924/181 | 5 | 0 | 44 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US6936854B2 | Optoelectronic substrate | US20020167013A1 | 2002-11-14 00:00:00 | US10/137,350 | 2002-05-03 00:00:00 | US6936854B2 | 2005-08-30 00:00:00 | 2001-05-10 00:00:00 | Tatsuya Iwasaki;Tohru Den | Canon Inc | | | G02B6/1225;B82Y20/00;G02B6/13;G02B6/34;G02B6/42;G02B6/4277;G02B6/43;H05K1/0274;H05K1/053 | 16 | 25 | 68 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US6878969B2 | Light emitting device | US20040016936A1 | 2004-01-29 00:00:00 | US10/447,232 | 2003-05-29 00:00:00 | US6878969B2 | 2005-04-12 00:00:00 | 2002-07-29 00:00:00 | Kenichiro Tanaka;Masao Kubo;Tomoaki Matsushima;Ryoichi Terauchi | Panasonic Electric Works Co Ltd | | | H01L33/20;H01L33/025;H01L2933/0083;H01L33/22 | 25 | 9 | 99 | Expired - Lifetime | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP4329374B2 | 発光素子およびその製造方法 | JP2004128445A | 2004-04-22 00:00:00 | JP2003086107A | 2003-03-26 00:00:00 | JP4329374B2 | 2009-09-09 00:00:00 | 2002-07-29 00:00:00 | 健一郎 田中;雅男 久保;朝明 松嶋;亮一 寺内 | Panasonic Corp;Panasonic Electric Works Co Ltd | | | | 10 | 10 | 72 | Expired - Lifetime | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP2004200209A | Method of forming conductive pattern of electrode, etc., surface light emitting type semiconductor laser using the same, and its manufacturing method | JP2004200209A | 2004-07-15 00:00:00 | JP2002363484A | 2002-12-16 00:00:00 | | | 2002-12-16 00:00:00 | Masahiro Yoshikawa;昌宏 吉川 | Fujifilm Business Innovation Corp | | | H01S5/18311;H01S5/18394;H01L2224/18;H01S2301/176;H01S5/0282;H01S5/2081 | 23 | 11 | 38 | Pending | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP4610863B2 | Improved LED efficiency using photonic crystal structure | JP2004289096A | 2004-10-14 00:00:00 | JP2003119095A | 2003-03-19 00:00:00 | JP4610863B2 | 2011-01-12 00:00:00 | 2003-03-19 00:00:00 | アール クレイムス マイケル;エム シガラス ミハイル;ジェイ ウィーラー ジュニア ジョナサン | フィリップス ルミレッズ ライティング カンパニー リミテッド ライアビリティ カンパニー | | | | 18 | 5 | 14 | Expired - Lifetime | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP4317375B2 | Nanoprint apparatus and fine structure transfer method | JP2004288783A | 2004-10-14 00:00:00 | JP2003077295A | 2003-03-20 00:00:00 | JP4317375B2 | 2009-08-19 00:00:00 | 2003-03-20 00:00:00 | 成久 元脇;昭浩 宮内;雅彦 荻野;孝介 桑原 | Hitachi Ltd | | | B82Y10/00;B29C33/58;B29C59/022;B29C59/025;B82Y40/00;G03F7/0002;G11B5/743;B29C2059/023;B29C37/0067;B29C37/0075;G11B5/74;G11B5/82;G11B5/84;H05K3/12;Y10S977/887 | 7 | 13 | 84 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US7083993B2 | Methods of making multi-layer light emitting devices | US20040206962A1 | 2004-10-21 00:00:00 | US10/724,005 | 2003-11-26 00:00:00 | US7083993B2 | 2006-08-01 00:00:00 | 2003-04-15 00:00:00 | Alexei A. Erchak;John W Graff;Michael Gregory Brown;Scott W. Duncan | Luminus Devices Inc | | | H01L33/20;H01L2933/0083;H01L33/0093 | 38 | 170 | 75 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | EP1644991A2 | Semiconductor light emitting device, method of manufacturing the same, and lighting apparatus and display apparatus using the same | EP1644991A2 | 2006-04-12 00:00:00 | EP04747708A | 2004-07-12 00:00:00 | | | 2003-07-16 00:00:00 | Hideo Nagai | Panasonic Corp | | | H01L27/156;H01L23/16;H01L25/0753;H01L2224/48091;H01L2224/73265;H01L33/20 | 0 | 25 | 121 | Withdrawn | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US20070267646A1 | Light Emitting Device Including a Photonic Crystal and a Luminescent Ceramic | US20070267646A1 | 2007-11-22 00:00:00 | US11/829,799 | 2007-07-27 00:00:00 | | | 2004-06-03 00:00:00 | Jonathan Wierer;Serge Bierhuizen;Aurelien David;Michael Krames;Richard Weiss | Lumileds LLC | | | H01L33/505;B82Y20/00;C04B35/44;C04B35/547;C04B35/584;C04B35/597;C04B35/6268;C04B35/64;C04B35/645;C09K11/7774;H01L33/20;C04B2235/3213;C04B2235/3224;C04B2235/3225;C04B2235/3286;C04B2235/6027;C04B2235/662;H01L2924/0002;H01L2933/0083;H01L33/007;H01L33/0093;H01L33/105;H01L33/405;H01L33/501;H01L33/58;H01L33/60;H01L33/644;H01S5/11;H01S5/34333 | 33 | 34 | 79 | Abandoned | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP2006196658A | Semiconductor light emitting element and manufacturing method thereof | JP2006196658A | 2006-07-27 00:00:00 | JP2005006263A | 2005-01-13 00:00:00 | | | 2005-01-13 00:00:00 | Kenji Orita;賢児 折田 | Panasonic Holdings Corp | | | | 26 | 0 | 19 | Pending | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP2007109689A | 発光素子、発光素子の製造方法及び画像表示装置 | JP2007109689A | 2007-04-26 00:00:00 | JP2005295971A | 2005-10-11 00:00:00 | | | 2005-10-11 00:00:00 | Taisuke Yamauchi;泰介 山内 | Seiko Epson Corp | | | G02B27/286;H04N9/3105;H04N9/3167 | 13 | 14 | 20 | Pending | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US7687811B2 | Vertical light emitting device having a photonic crystal structure | US20070221907A1 | 2007-09-27 00:00:00 | US11/704,390 | 2007-02-09 00:00:00 | US7687811B2 | 2010-03-30 00:00:00 | 2006-03-21 00:00:00 | Jun Ho Jang;Yong Tae Moon | Suzhou Lekin Semiconductor Co Ltd;LG Electronics Inc | | | H01L33/20;H01L2933/0083 | 14 | 18 | 34 | Active | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | KR100736623B1 | 수직형 발광 소자 및 그 제조방법 | KR100736623B1 | 2007-07-09 00:00:00 | KR1020060041006A | 2006-05-08 00:00:00 | | | 2006-05-08 00:00:00 | 조현경;장준호 | 엘지전자 주식회사;엘지이노텍 주식회사 | | | H01L33/20;H01L33/405;H01L33/42;H01L33/48;H01L33/60;H01L33/62;H01L2224/32245;H01L2224/48091;H01L2224/48247;H01L2224/48257;H01L2224/48465;H01L2224/73265;H01L2933/0016;H01L2933/0033;H01L2933/0083;H01L33/0093;H01L33/22;H01L33/44;Y10S438/977 | 18 | 136 | 147 | | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP4231880B2 | Three-dimensional structure, light emitting device having the same, and method for manufacturing the same | JP2008030235A | 2008-02-14 00:00:00 | JP2006203574A | 2006-07-26 00:00:00 | JP4231880B2 | 2009-03-04 00:00:00 | 2006-07-26 00:00:00 | 本 明 藤;西 務 中 | Toshiba Corp | | | G02B6/1225;B82Y20/00;H10K50/856;H10K50/858 | 10 | 4 | 12 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US7829905B2 | Semiconductor light emitting device | US20080061304A1 | 2008-03-13 00:00:00 | US11/516,632 | 2006-09-07 00:00:00 | US7829905B2 | 2010-11-09 00:00:00 | 2006-09-07 00:00:00 | Yan Huang;Kuo-An Chiu;Hua-Jun Peng;Jian Feng;Hung-Shen Chu | Hong Kong Applied Science and Technology Research Institute ASTRI | | | H01L33/44;H01L2933/0083;H01L33/405 | 25 | 10 | 38 | Active | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP2008098526A | 発光素子 | JP2008098526A | 2008-04-24 00:00:00 | JP2006280731A | 2006-10-13 00:00:00 | | | 2006-10-13 00:00:00 | Satoshi Wada;聡 和田;Ryohei Inasawa;良平 稲沢 | Toyoda Gosei Co Ltd | | | | 9 | 0 | 11 | Pending | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | KR100886821B1 | Enhanced current characteristic photonic crystal light emitting diode and fabrication method thereof | KR20090001903A | 2009-01-09 00:00:00 | KR20070052277A | 2007-05-29 00:00:00 | KR100886821B1 | 2009-03-04 00:00:00 | 2007-05-29 00:00:00 | 김상묵;백종협;이상헌;김윤석;이승재;진정근;유영문;염홍서 | 한국광기술원 | | | | 12 | 3 | 8 | | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | KR101341374B1 | 광자결정 발광소자 및 그 제조방법 | KR20090012494A | 2009-02-04 00:00:00 | KR1020070076376A | 2007-07-30 00:00:00 | KR101341374B1 | 2013-12-16 00:00:00 | 2007-07-30 00:00:00 | 이동율;박성주;권민기;김자연;김용천;오방원;황석민;김제원 | 삼성전자주식회사 | | | H01L33/42;H01L2933/0083 | 15 | 15 | 34 | | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP2009267263A | 発光装置およびその製造方法 | JP2009267263A | 2009-11-12 00:00:00 | JP2008117747A | 2008-04-28 00:00:00 | | | 2008-04-28 00:00:00 | Ryuji Yoneda;竜司 米田 | Kyocera Corp | | | | 7 | 12 | 11 | Pending | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | KR100933529B1 | Light-Emitting Device with Photonic Crystal Structure | KR20090123817A | 2009-12-02 00:00:00 | KR1020090046577A | 2009-05-27 00:00:00 | KR100933529B1 | 2009-12-23 00:00:00 | 2008-05-28 00:00:00 | 전헌수;차국헌;김호섭;최윤경 | 재단법인서울대학교산학협력재단 | | | H01L33/50;H01L2933/0083 | 20 | 8 | 30 | | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP5379434B2 | 発光素子用サファイア基板の製造方法 | JP2010074090A | 2010-04-02 00:00:00 | JP2008242943A | 2008-09-22 00:00:00 | JP5379434B2 | 2013-12-25 00:00:00 | 2008-09-22 00:00:00 | 智 上山;由基夫 金子;敦志 鈴木;文晴 寺前;俊行 近藤 | 学校法人 名城大学 | | | | 3 | 5 | 19 | Active | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | KR101040462B1 | Light emitting device and method for fabricating the same | KR20100063932A | 2010-06-14 00:00:00 | KR1020080122308A | 2008-12-04 00:00:00 | KR101040462B1 | 2011-06-09 00:00:00 | 2008-12-04 00:00:00 | 김선경;조현경;박경근 | 엘지이노텍 주식회사 | | | H01L33/20;H01L2933/0083 | 9 | 15 | 22 | | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | SG171832A1 | Photocurable composition and method for manufacturing a molded body having a fine surface pattern | SG171832A1 | 2011-07-28 00:00:00 | SG2011038304A | 2009-11-30 00:00:00 | | | 2008-12-05 00:00:00 | Yasuhide Kawaguchi | Asahi Glass Co Ltd | | | C08F290/067;B82Y10/00;B82Y40/00;C08G18/672;C08L33/06;C08L33/24;G03F7/0002;G03F7/0046;G03F7/0048;G03F7/027;H01L21/0273;C08L2205/02 | 9 | 13 | 21 | | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | GB0902569D0 | An optical device | GB0902569D0 | 2009-04-01 00:00:00 | GBGB0902569.3A | 2009-02-16 00:00:00 | | | 2009-02-16 00:00:00 | | University of Southampton | | | H01L31/02322;H01L27/14603;H01L31/0352;H01L31/035281;H01L31/055;H01L33/0004;H01L33/20;H01L33/505;H01L33/08;Y02E10/52 | 0 | 10 | 50 | Ceased | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | KR100999713B1 | 발광소자 및 그 제조방법 | KR20100104255A | 2010-09-29 00:00:00 | KR1020090022549A | 2009-03-17 00:00:00 | KR100999713B1 | 2010-12-08 00:00:00 | 2009-03-17 00:00:00 | 김선경;송현돈;이진욱 | 엘지이노텍 주식회사 | | | H01L33/20 | 16 | 21 | 7 | | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP5300078B2 | Photonic crystal light emitting diode | JP2011086853A | 2011-04-28 00:00:00 | JP2009240213A | 2009-10-19 00:00:00 | JP2011086853A5 | 2012-08-09 00:00:00 | 2009-10-19 00:00:00 | 進 野田;卓 浅野;誠之 冨士田;均 北川 | Kyoto University;Alps Alpine Co Ltd | | | | 7 | 3 | 12 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | CN102576784B | 发光元件和设置有该发光元件的投影显示装置 | CN102576784A | 2012-07-11 00:00:00 | CN201080047758.0A | 2010-10-15 00:00:00 | CN102576784B | 2015-06-17 00:00:00 | 2009-10-23 00:00:00 | 富山瑞穗;片山龙一 | NEC Corp | 日本电气株式会社 | H01L33/22;G02F1/13357;G03B21/00;G03B21/14 | G03B21/2073;G02B1/005;G02B6/1225;G03B21/2033;G03B33/12;H01L33/18;H01L33/20;H04N9/3167;H10K50/868;H01L2933/0083;H01L33/44 | 9 | 14 | 17 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | DE102009057780A1 | Optoelektronisches Halbleiterbauteil und photonischer Kristall | DE102009057780A1 | 2011-06-16 00:00:00 | DE102009057780A | 2009-12-10 00:00:00 | | | 2009-12-10 00:00:00 | Krister Bergenek;Christopher Wiesmann;Thomas F. Prof. Krauss | Ams Osram International GmbH;University of St Andrews | | | G02B1/005;H01L33/22;H01L33/20;H01L33/38;H01L2933/0083 | 15 | 10 | 18 | Withdrawn | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP5549338B2 | 紫外光放射用窒素化合物半導体ledおよびその製造方法 | JP2011222728A | 2011-11-04 00:00:00 | JP2010090003A | 2010-04-09 00:00:00 | JP2011222728A5 | 2012-11-01 00:00:00 | 2010-04-09 00:00:00 | 政志 月原;宏治 川▲崎▼ | Ushio Denki KK | | | H01L33/04;H01L33/32;H01L33/007;H01L33/14;H01L33/06 | 2 | 13 | 20 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | JP5331051B2 | Light emitting element | JP2011228513A | 2011-11-10 00:00:00 | JP2010097585A | 2010-04-21 00:00:00 | JP5331051B2 | 2013-10-30 00:00:00 | 2010-04-21 00:00:00 | 賢児 折田 | Panasonic Corp;Panasonic Holdings Corp | | | H01L33/505;G02F1/1336;G02F1/133602;G02F1/133606;G02F1/133615;G02F1/13362;H01L33/465;G02F1/133614;G02F1/133617 | 5 | 28 | 8 | Expired - Fee Related | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US8907322B2 | Deep ultraviolet light emitting diode | US20110309326A1 | 2011-12-22 00:00:00 | US13/161,961 | 2011-06-16 00:00:00 | US8907322B2 | 2014-12-09 00:00:00 | 2010-06-18 00:00:00 | Remigijus Gaska;Maxim S. Shatalov;Michael Shur | Sensor Electronic Technology Inc | | | H01L33/04;H01L33/10;H01L33/32;H01L33/06;H01L33/22;H01L33/385;H01L33/405 | 21 | 40 | 30 | Active | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | US9130348B2 | Two-dimensional photonic crystal laser | US20120027038A1 | 2012-02-02 00:00:00 | US13/192,852 | 2011-07-28 00:00:00 | US9130348B2 | 2015-09-08 00:00:00 | 2010-07-30 00:00:00 | Susumu Noda;Takui Sakaguchi;Kazuya Nagase;Wataru Kunishi;Eiji Miyai;Yoshikatsu Miura;Dai Ohnishi | Rohm Co Ltd;Kyoto University | | | H01S5/11;H01S5/1231;H01S5/105;H01S5/18316;H01S5/18319;H01S5/3013;H01S2301/17;H01S5/187 | 11 | 19 | 15 | Active | TRUE | FALSE |
CN107534072B | 丸文株式会社;东芝机械株式会社;国立研究开发法人理化学研究所;株式会社爱发科;东京应化工业株式会社 | 发明授权 深紫外LED及其制造方法 | CN107534072B | 2019-04-19 00:00:00 | 2016800031793 | 2016-11-01 00:00:00 | 2018-01-02 00:00:00 | H01L33/10(2006.01)I; H01L33/32(2006.01)I | H01L33/16;H01L33/0075;H01L33/04;H01L33/10;H01L33/12;H01L33/14;H01L33/32;H01L33/405;H01L2933/0016;H01L2933/0058 | KR20120092325A | Light emitting diode having photonic crystal structure and method of fabricating the same | KR20120092325A | 2012-08-21 00:00:00 | KR1020110012300A | 2011-02-11 00:00:00 | | | 2011-02-11 00:00:00 | 서원철;최주원 | 서울옵토디바이스주식회사 | | | H01L33/18;H01L33/22;H01L33/10;H01L2933/0083;H01L33/0093;H01L33/20 | 19 | 27 | 16 | | TRUE | FALSE |